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Effect of operational conditions on removal of 4-chlorophenol in water using UV/NiO process

Paper Topic: 
Water and Wastewater Treatment

Pages :
118 - 129

Corresponing Author: 
Roya Alimoradzadeh
Assadi A., Alimoradzadeh R., Nasseri S. and Mehrasbi M.R.
Paper ID: 
Paper Status: 
Date Paper Accepted: 
Paper online: 

This study present the removal of 4-chlorophenol (4-CP) from water by nickel oxide (NiO) nanoparticles. Photodegradation was compared using different processes in a batch reactor with medium-pressure mercury lamp irradiation. The effects of operating conditions such as feed concentration of reactants, catalyst load, pH, and half-life time on photodegradation system were evaluated. The results showed that photodegradation using UV/NiO system in the presence of H2O2 were much more effective than using either UV/H2O2 or UV/NiO processes. The optimum conditions for the complete degradation of 4-CP were achieved at a neutral pH, with 0.2 mol l-1 H2O2, and 0.05 g l-1 of NiO. However, no significant pH effects were observed in the range of 4-10. Also, the best TOC removal and Cl- ions formation results were achieved by combined system with 48 and 80%, respectively. The illuminated NiO nanoparticles had lower influence on the degradation of 4-CP but dramatically promoted the mineralization of 4-CP. For all these reactions, the degradation rates are evaluated by determining their first-order rate constants and half-life times. The reaction rate constants ranged from 0.0003 min1 by direct photolysis to 0.029 min1 and 0.083 min1 using UV/NiO in absent and presence of H2O2, respectively. 


4-chlorophenol, UV light, Nickel oxide, Hydrogen peroxide