You are hereHome | Effect of operational conditions on removal of 4-chlorophenol in water using UV/NiO process
Effect of operational conditions on removal of 4-chlorophenol in water using UV/NiO processView Crossref metadata(active tab) <div id="edit-xml" class="form-item form-type-item"> <?xml version="1.0"?> <doi_batch version="4.4.1" xmlns="http://www.crossref.org/schema/4.4.1" xmlns:jats="http://www.ncbi.nlm.nih.gov/JATS1" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.crossref.org/schema/4.4.1 http://www.crossref.org/schemas/crossref4.4.1.xsd"><head><doi_batch_id>000716</doi_batch_id><timestamp>1715937097</timestamp><depositor><depositor_name>University of the Aegean</depositor_name><email_address>uoa@university.com</email_address></depositor><registrant>Global NEST Journal</registrant></head><body><journal><journal_metadata><full_title>Global NEST Journal</full_title><full_title>Global NEST: the international Journal</full_title><issn media_type="print">1790-7632</issn><issn media_type="electronic">2241-777X</issn></journal_metadata><journal_issue><titles><title>Issue 1</title></titles><publication_date><month>03</month><year>2024</year></publication_date><journal_volume><volume>17</volume></journal_volume><issue>1</issue></journal_issue><journal_article><titles><title>Effect of operational conditions on removal of 4-chlorophenol in water using UV/NiO process</title></titles><abstract xmlns="http://www.ncbi.nlm.nih.gov/JATS1"><p><div> <div> <p>This study present the removal of 4-chlorophenol (4-CP) from water by nickel oxide (NiO) nanoparticles. Photodegradation was compared using different processes in a batch reactor with medium-pressure mercury lamp irradiation. The effects of operating conditions such as feed concentration of reactants, catalyst load, pH, and half-life time on photodegradation system were evaluated. The results showed that photodegradation using UV/NiO system in the presence of H<sub>2</sub>O<sub>2</sub> were much more effective than using either UV/H<sub>2</sub>O<sub>2</sub> or UV/NiO processes. The optimum conditions for the complete degradation of 4-CP were achieved at a neutral pH, with 0.2 mol l<sup>-1</sup> H<sub>2</sub>O<sub>2</sub>, and 0.05 g l<sup>-1</sup> of NiO. However, no significant pH effects were observed in the range of 4-10. Also, the best TOC removal and Cl<sup>-</sup> ions formation results were achieved by combined system with 48 and 80%, respectively. The illuminated NiO nanoparticles had lower influence on the degradation of 4-CP but dramatically promoted the mineralization of 4-CP. For all these reactions, the degradation rates are evaluated by determining their first-order rate constants and half-life times. The reaction rate constants ranged from 0.0003 min<sup>−</sup><sup>1</sup> by direct photolysis to 0.029 min<sup>−</sup><sup>1</sup> and 0.083 min<sup>−</sup><sup>1</sup> using UV/NiO in absent and presence of H<sub>2</sub>O<sub>2</sub>, respectively. </p> </div> </div> <p> </p> </p></abstract><publication_date><month>12</month><day>09</day><year>2014</year></publication_date><pages><first_page>118</first_page><last_page>129</last_page></pages><publisher_item><identifier id_type="pii">gnest_01479</identifier></publisher_item><doi_data><doi>10.30955/gnj.001479</doi><timestamp>1715937097</timestamp><resource>https://journal.gnest.org/publication/gnest_01479</resource></doi_data></journal_article></journal></body></doi_batch> </div>
